EMF

Claude Ederer, ETH Zürich, Switzerland

Hiroshi Funakubo, Tokyo Institute of Technology, Japan

Lauren Garten, U.S. Naval Research Laboratory, United States of America

Philippe Ghosez, University of Liège, Belgium

Alexei Gruverman, University of Nebraska, USA

Mael Guennou, University of Luxembourg, Luxembourg

Jiri Hlinka, Institute of Physics, Czech Academy of Sciences, Czech Republic

Andreas Klein, TU Darmstadt, Germany

Jurij Koruza, TU Darmstadt, Germany

Barbara Malic, Josef Stefan Institute, Ljubljana, Slovenia

Raymond McQuaid, Queen's University of Belfast, United Kingdom

Dennis Meier, Norwegian University of Science and Technology, Norway

Pavan Nukala, University of Gronigen, The Netherlands

Silvia Picozzi, Consiglio Nazionale delle Ricerche, CNR-SPIN, Italy

Ekhard Salje, University of Cambridge, United Kingdom

Vladimir Shur, Ural Federal University, Russia

Massimiliano Stengel, Materials Science Institute of Barcelona, Spain

Igor Stolitchnov, EPFL, Switzerland

Yukio Watanabe, Kyushu U, Japan

Kyle Webber, Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany

ICE

Sarbajit Banerjee, Texas A&M Unviversity, USA

Nicolae Barsan, University of Tübingen, Germany

Manuel Bibes, Thales, France

Edith Bucher, University of Leoben, Austria

Monica Burriel, Institut Polytechnique de Grenoble, France

Maytal Caspary Toroker, Technon - Israel Institute of Technology, Israel

Ivano Eliglio Castelli, Technical University of Denmark, Denmark

Mariona Coll, Materials Science Institute of Barcelona, Spain

Liam Collins, Oak Ridge Nat.Lab, USA

Ethan Crumlin, Berkeley Lab LBL, USA

Neil Dasgupta, University of Michigan, USA

Rolf Erni, EMPA, Switzerland

Jürgen Fleig, TU Wien, Austria

Holger Fritze, TU Claustal, Germany

Tor Grande, Norwegian University of Science and Technology, Norway

Daneil Grave, Technion - Israel Institute of Technology, Israel

Christopher Graves, DTU Energy, Denmark

Alexis Grimaud, Collège de France, France

Felix Gunkel, Forschungszentrum Jülich, Germany

George Harrington, Massachusetts Institute of Technology, USA

Taro Hitosugi, Tokyo Institute of Technology, Japan

Nobuhito Imanaka, Osaka University, Japan

Il-Doo Kim, Korea Advanced Institute of Science and Technology KAIST , South Korea

Dino Klotz, Massachusetts Institute of Technology, USA

Lior Kornblum, Technion, Israel

Michael Kozicki, Arizona State University, United States of America

Markus Kubicek, ETH Zürich, Switzerland

Miguel Laguna-Bercero, Inst. of Mat. Sci. of Aragon ICMA, Spain

Na Lu, Perdue University, USA

Igor Lubomirsky, Weizmann Institute of Science, Israel

Antoine Maignan, Université du Havre, Laboratoire CRISMAT, France

Rotraut Merkle, Max Planck Institute, Germany

Gabriel Molas, CEALETI, France

Pasquale Orgiani, CNR-SPIN Institute, Trieste, Italy

Greta Patzke, University of Zurich, Switzerland

Nicola Helen Perry, MIT / Univ. of  Illinois, USA

Wolfgang Preis, University of Leoben, Austria

Michele Riva, TU Wien, Austria

Jennifer Rupp, Massachusetts Institute of Technology, USA

Donald Siegel, University of Michigan, USA

Derek Sinclair, University of Sheffield, UK

Ludmilla Steier, Imperial College, UK

Albert Tarancon, Catalonia Institute for Energy Research  IREC, Spain

Vasiliki Tileli, EPFL, Switzerland

Morgan Trassin, ETH Zürich, Switzerland

Yoed Tsur, Technion, Israel

Rainer Waser, RWTH Aachen, Germany

Yuchao Yang, Peking University, China

Bilge Yildiz, Massachusetts Institute of Technology, USA

ISAF

Martin Alexe, University of Warwick, United Kingdom]

Juliette Cardoletti, Technische Universität Darmstadt, Germany

Gustau Catalán, Catalan Institute of Nanoscience and Nanotechnology, Spain

Long-Qing Chen, Pennsylvania State University, United States of America

Charlotte Cochard, Queen's University Belfast, United Kingdom

John Daniels, University of New South Wales, Australia

Emmanuel Defay, Luxembourg Institute of Science and Technology (LIST), Luxembourg

Elizabeth Dickey, North Carolina State University, United States of America

Brahim Skhil, Laboratoire Structures, Propriétés et Modélisation des Solides (SPMS), CentraleSupélec, CNRS-UMR8580, Université Paris-Saclay, G, France

Stephen Ducharme, University of Nebraska, United States of America

Lynn Ewart, NUWCNPT, United States of America

Peter Finkel, Naval Research Laboratory, United States of America

Vladimir Fridkin, Shubnikov Institute of Crystallography of Russian Academy of Sciences, Russia

Semën Gorfman, Tel Aviv University, Israel

Marion Höfling, Technical University of Darmstadt, Germany

Jon Ihlefeld, University of Virginia, United States of America

Hamideh Khanbareh, University of Bath, United Kingdom

Ho-Yong Lee, Ceracomp, South Korea

Jingfeng Li, Tsinghua University, China

Céline Lichtensteiger, University of Geneva, Switzerland

Lane W. Martin, University of California, Berkeley, USA

Sylvia Matzen, Université Paris-Sud, France

Leopoldo Molina-Luna, TU Darmstadt, Germany

John Phair, Pyreos Ltd, United Kingdom

Vasudevan Rama, Oak Ridge National Laboratory, United States of America

Clive Randall, Pennsylvania State University, United States of America

Andrew M. Rappe, University of Pennsylvania, United States of America

Tadej Rojac, Josef Stefan Institute, Ljubljana, Slovenia

James Roscow, University of Bath, United Kingdom

Daniel Sando, University of New South Wales, Australia

Tae Kwon Song, Changwon National University, South Korea

Jonathan Spanier, Drexel University, United states of America

Nicholas Strnad, University of Maryland, United States of America

Scott Summerfelt, Texas Instruments, United states of America

Takaaki Tsurumi, Tokyo Institute of Technology, Japan

Julian Walker, Norwegian University of Science and Technology, Norway

Hong Wang, Southern University of Science and Technology, China

Junling Wang, Nanyang University, Singapore

Xiaohui Wang, Tsinghua University, China

Mingmin Yang, University of Warwick, United Kingdom

Zuo-Guang Ye, Simon Fraser University, Canada

Hiroko Yokota, Chiba University, Japan

Christina Zacharaki, National Centre for Scientific Research Demokritos, Greece

Qifa Zhou, University of Southern California, United states of America

Pavlo Zubko, University College of London (UCL), United Kingdom

IWPM

Jun Akedo, National Institute of Advanced Industrial Science and Technology (AIST), Japan

Betul Akkopru-Akgun, Penn State University, United States of America

Hartmut Kueppers, Bosch GmbH, Germany

Tokihiro Nishihara, Taiyo Yuden, Japan

Hisao Suzuki, Shizuoka University, Japan

Susan Trolier-McKinstry, Penn State University, USA

Masato Uehara, National Institute of Advanced Industrial Science and Technology (AIST), Japan

Bernhard Wagner, Fraunhofer Institute for Silicon Technology, Germany

Naoto Yarie, Silicon Sensing, Japan

PFM

Irene Arias, Universitat Politecnica de Catalunya, Spain

Saikat Das, Seoul National University, South Korea

Donald M. Evans, Norwegian University of Science and Technology, Norway

Bryan D. Huey, Unverstiy of Connecticut, United States of America

Ji Young Jo, Gwangju Institute of Science and Technology, South Korea

Jiangyu Li, Shenzhen Institute of Advanced Technology, China

Olga S. Ovchinnikova, Oak Ridge National Laboratory, United States of America

Brian Rodriguez, University College Dublin, Ireland