This list is not yet complete

Jun Akedo, National Institute of Advanced Industrial Science and Technology (AIST), Japan

Irene Arias, Universitat Politecnica de Catalunya, Spain

Sarbajit Banerjee, Texas A&M Unviversity, USA

Monica Burriel, Institut Polytechnique de Grenoble, France

Gustau Catalán, Catalan Institute of Nanoscience and Nanotechnology, Barcelona, Spain

Long-Qing Chen, Pennsylvania State University, USA

John Daniels, University of New South Wales, Australia

Saikat Das, Seoul National University, South Korea

Emmanuel Defay, Luxembourg Institute of Science and Technology (LIST), Luxembourg

Elisabeth Dickey, North Carolina State University, USA

Brahim Dkhil, University of Paris-Sacley, France

Claude Ederer, ETH Zürich, Switzerland

Donald M. Evans, Norwegian University of Science and Technology, Norway

Saeedeh Farokhipoor, University of Gronigen, The Netherlands

Hiroshi Funakubo, Tokyo Institute of Technology, Japan

Laureen Garten, Naval Research Laboratory, USA

Philippe Ghosez, University of Liège, Belgium

Semen Gorfman, Tel Aviv University, Israel

Tor Grande, Norwegian University of Science and Technology, Norway

Alexei Gruverman, University of Nebraska, USA

Mael Guennou, University of Luxembourg, Luxembourg

Jirka Hlinka, Institute of Physics, Czech Academy of Sciences, Czech Republic

Bryan D. Huey, Unverstiy of Connecticut, USA

Ji Young Jo, Gwangju Institute of Science and Technology, South Korea

Andreas Klein, TU Darmstadt, Germany

Michael Kozicki, Arizona State University, USA

Jurij Koruza, TU Darmstadt, Germany

Hartmut Kueppers, Bosch GmbH, Germany

Ho-Yong Lee, Ceracomp, South Korea

Jiangyu Li, Universty of Washington, USA

Jingfeng Li, Tsinghua University, China

Céline Lichtensteiger, University of Geneva, Switzerland

Barbara Malic, Josef Stefan Institute, Ljubljana, Slovenia

Lane W. Martin, University of California, Berkeley, USA

Sylvia Matzen, Université Paris-Sud, France

Raymond McQuaid, Queen's University of Belfast, United Kingdom

Dennis Meier, Norwegian University of Science and Technology, Norway

Gabriel Molas, CEALETI, France

Leopoldo Molina-Luna, TU Darmstadt, Germany

Tokihiro Nishihara, Taiyo Yuden, Japan

Beatriz Noheda, University of Gronigen, The Netherlands

Olga S. Ovchinnikova, Oak Ridge Nat.Lab, USA

John Phair, Pyreos Ltd, United Kingdom

Silvia Picozzi, Consiglio Nazionale delle Ricerche, CNR-SPIN, Italy

Clive Randall, Pennsylvania State University, USA

Brian Rodriguez,  University College Dublin, Ireland

Tadej Rojac, Josef Stefan Institute, Ljubljana, Slovenia

Ekhard Salje, University of Cambridge, United Kingdom

Daniel Sando, University of New South Wales, Australia

Vladimir Shur, Ural Federal University, Russia

Massimiliano Stengel, Materials Science Institute of Barcelona, Spain

Igor Stolitchnov, EPFL, Switzerland

Scott Summerfelt, Texas Instruments, USA

Hisao Suzuki, Shizuoka University, Japan

T. Takemoto, Silicon Sensing, Japan

Vasiliki Tileli, EPFL, Switzerland

Susan Trolier-McKinstry, Pennsylvania State University, USA

Masato Uehara, National Institute of Advanced Industrial Science and Technology (AIST), Japan

Rama K. Vasudevan, Oak Ridge Nat.Lab, USA

Bernhard Wagner, Fraunhofer Institute for Silicon Technology, Germany

Hong Wang, Southern University of Science and Technology, China

Junling Wang, Nanyang University, Singapore

Xiaohui Wang, Tsinghua University, China

Rainer Waser, RWTH Aachen, Germany

Kyle Webber, Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany

Mingmin Yang, University of Warwick, United Kingdom

Yuchao Yang, Peking University, China

Hiroko Yokota, Chiba University, Japan

Qifa Zhou, University of Southern California, USA

Pavlo Zubko, University College of London (UCL), United Kingdom