EMF
Claude Ederer, ETH Zürich, Switzerland
Hiroshi Funakubo, Tokyo Institute of Technology, Japan
Lauren Garten, U.S. Naval Research Laboratory, United States of America
Philippe Ghosez, University of Liège, Belgium
Alexei Gruverman, University of Nebraska, USA
Mael Guennou, University of Luxembourg, Luxembourg
Jiri Hlinka, Institute of Physics, Czech Academy of Sciences, Czech Republic
Andreas Klein, TU Darmstadt, Germany
Jurij Koruza, TU Darmstadt, Germany
Barbara Malic, Josef Stefan Institute, Ljubljana, Slovenia
Raymond McQuaid, Queen's University of Belfast, United Kingdom
Dennis Meier, Norwegian University of Science and Technology, Norway
Pavan Nukala, University of Gronigen, The Netherlands
Silvia Picozzi, Consiglio Nazionale delle Ricerche, CNR-SPIN, Italy
Ekhard Salje, University of Cambridge, United Kingdom
Vladimir Shur, Ural Federal University, Russia
Massimiliano Stengel, Materials Science Institute of Barcelona, Spain
Igor Stolitchnov, EPFL, Switzerland
Yukio Watanabe, Kyushu U, Japan
Kyle Webber, Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany
ICE
Sarbajit Banerjee, Texas A&M Unviversity, USA
Nicolae Barsan, University of Tübingen, Germany
Manuel Bibes, Thales, France
Edith Bucher, University of Leoben, Austria
Monica Burriel, Institut Polytechnique de Grenoble, France
Maytal Caspary Toroker, Technon - Israel Institute of Technology, Israel
Ivano Eliglio Castelli, Technical University of Denmark, Denmark
Mariona Coll, Materials Science Institute of Barcelona, Spain
Liam Collins, Oak Ridge Nat.Lab, USA
Ethan Crumlin, Berkeley Lab LBL, USA
Neil Dasgupta, University of Michigan, USA
Rolf Erni, EMPA, Switzerland
Jürgen Fleig, TU Wien, Austria
Holger Fritze, TU Claustal, Germany
Tor Grande, Norwegian University of Science and Technology, Norway
Daneil Grave, Technion - Israel Institute of Technology, Israel
Christopher Graves, DTU Energy, Denmark
Alexis Grimaud, Collège de France, France
Felix Gunkel, Forschungszentrum Jülich, Germany
George Harrington, Massachusetts Institute of Technology, USA
Taro Hitosugi, Tokyo Institute of Technology, Japan
Nobuhito Imanaka, Osaka University, Japan
Il-Doo Kim, Korea Advanced Institute of Science and Technology KAIST , South Korea
Dino Klotz, Massachusetts Institute of Technology, USA
Lior Kornblum, Technion, Israel
Michael Kozicki, Arizona State University, United States of America
Markus Kubicek, ETH Zürich, Switzerland
Miguel Laguna-Bercero, Inst. of Mat. Sci. of Aragon ICMA, Spain
Na Lu, Perdue University, USA
Igor Lubomirsky, Weizmann Institute of Science, Israel
Antoine Maignan, Université du Havre, Laboratoire CRISMAT, France
Rotraut Merkle, Max Planck Institute, Germany
Gabriel Molas, CEALETI, France
Pasquale Orgiani, CNR-SPIN Institute, Trieste, Italy
Greta Patzke, University of Zurich, Switzerland
Nicola Helen Perry, MIT / Univ. of Illinois, USA
Wolfgang Preis, University of Leoben, Austria
Michele Riva, TU Wien, Austria
Jennifer Rupp, Massachusetts Institute of Technology, USA
Donald Siegel, University of Michigan, USA
Derek Sinclair, University of Sheffield, UK
Ludmilla Steier, Imperial College, UK
Albert Tarancon, Catalonia Institute for Energy Research IREC, Spain
Vasiliki Tileli, EPFL, Switzerland
Morgan Trassin, ETH Zürich, Switzerland
Yoed Tsur, Technion, Israel
Rainer Waser, RWTH Aachen, Germany
Yuchao Yang, Peking University, China
Bilge Yildiz, Massachusetts Institute of Technology, USA
ISAF
Martin Alexe, University of Warwick, United Kingdom]
Juliette Cardoletti, Technische Universität Darmstadt, Germany
Gustau Catalán, Catalan Institute of Nanoscience and Nanotechnology, Spain
Long-Qing Chen, Pennsylvania State University, United States of America
Charlotte Cochard, Queen's University Belfast, United Kingdom
John Daniels, University of New South Wales, Australia
Emmanuel Defay, Luxembourg Institute of Science and Technology (LIST), Luxembourg
Elizabeth Dickey, North Carolina State University, United States of America
Brahim Skhil, Laboratoire Structures, Propriétés et Modélisation des Solides (SPMS), CentraleSupélec, CNRS-UMR8580, Université Paris-Saclay, G, France
Stephen Ducharme, University of Nebraska, United States of America
Lynn Ewart, NUWCNPT, United States of America
Peter Finkel, Naval Research Laboratory, United States of America
Vladimir Fridkin, Shubnikov Institute of Crystallography of Russian Academy of Sciences, Russia
Semën Gorfman, Tel Aviv University, Israel
Marion Höfling, Technical University of Darmstadt, Germany
Jon Ihlefeld, University of Virginia, United States of America
Hamideh Khanbareh, University of Bath, United Kingdom
Ho-Yong Lee, Ceracomp, South Korea
Jingfeng Li, Tsinghua University, China
Céline Lichtensteiger, University of Geneva, Switzerland
Lane W. Martin, University of California, Berkeley, USA
Sylvia Matzen, Université Paris-Sud, France
Leopoldo Molina-Luna, TU Darmstadt, Germany
John Phair, Pyreos Ltd, United Kingdom
Vasudevan Rama, Oak Ridge National Laboratory, United States of America
Clive Randall, Pennsylvania State University, United States of America
Andrew M. Rappe, University of Pennsylvania, United States of America
Tadej Rojac, Josef Stefan Institute, Ljubljana, Slovenia
James Roscow, University of Bath, United Kingdom
Daniel Sando, University of New South Wales, Australia
Tae Kwon Song, Changwon National University, South Korea
Jonathan Spanier, Drexel University, United states of America
Nicholas Strnad, University of Maryland, United States of America
Scott Summerfelt, Texas Instruments, United states of America
Takaaki Tsurumi, Tokyo Institute of Technology, Japan
Julian Walker, Norwegian University of Science and Technology, Norway
Hong Wang, Southern University of Science and Technology, China
Junling Wang, Nanyang University, Singapore
Xiaohui Wang, Tsinghua University, China
Mingmin Yang, University of Warwick, United Kingdom
Zuo-Guang Ye, Simon Fraser University, Canada
Hiroko Yokota, Chiba University, Japan
Christina Zacharaki, National Centre for Scientific Research Demokritos, Greece
Qifa Zhou, University of Southern California, United states of America
Pavlo Zubko, University College of London (UCL), United Kingdom
IWPM
Jun Akedo, National Institute of Advanced Industrial Science and Technology (AIST), Japan
Betul Akkopru-Akgun, Penn State University, United States of America
Hartmut Kueppers, Bosch GmbH, Germany
Tokihiro Nishihara, Taiyo Yuden, Japan
Hisao Suzuki, Shizuoka University, Japan
Susan Trolier-McKinstry, Penn State University, USA
Masato Uehara, National Institute of Advanced Industrial Science and Technology (AIST), Japan
Bernhard Wagner, Fraunhofer Institute for Silicon Technology, Germany
Naoto Yarie, Silicon Sensing, Japan
PFM
Irene Arias, Universitat Politecnica de Catalunya, Spain
Saikat Das, Seoul National University, South Korea
Donald M. Evans, Norwegian University of Science and Technology, Norway
Bryan D. Huey, Unverstiy of Connecticut, United States of America
Ji Young Jo, Gwangju Institute of Science and Technology, South Korea
Jiangyu Li, Shenzhen Institute of Advanced Technology, China
Olga S. Ovchinnikova, Oak Ridge National Laboratory, United States of America
Brian Rodriguez, University College Dublin, Ireland
